Professor Mark J. Kushner
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Location:
Lower Level Auditorium, Geddes HallHost:
Department of Aerospace and Mechanical Engineering
Affiliations
Low temperature Plasmas are used to modify a tremendously wide range of materials. Plasmas are used to functionalize commodity polymers, to fabricate microelectronics devices, to charge surfaces in printer engines and now to treat human tissue. The success of these technologies ultimately relies on the ability to finely control plasma properties in order to deliver the desired fluxes of radicals and ions to surfaces, which then synergistically modify those surfaces. Achieving this control ultimately requires one to control the energy and velocity distributions of charged and neutral particles in order to properly stimulate surface chemical processes. There has been an evolution of techniques to control these distributions using a variety of plasma excitation schemes. These techniques are now being challenged to provide the control required to fabricate nanoscale structures for microelectronics at one extreme and for biological applications of plasmas and plasma medicine, typically performed at atmospheric pressure, at the other extreme. In this talk, techniques to control plasma sources will be discussed with examples drawn from nanoscale fabrication and plasma treatment of human tissue.
Seminar Speaker:
Dr. Mark J. Kushner
Director, Michigan Institute for Plasma Science & Engineering (MIPSE)
Electrical Engineering and Computer Science Department; University of Michigan; Ann Arbor, Michigan
